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Sputtering Equipment

Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface by bombarding a target material with high-energy ions or atoms. This bombardment dislodges atoms from the target material, which then travel through a vacuum chamber and deposit onto the surface of the substrate, forming a thin film. Learn more about sputtering equipment →

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Glossary
  • sputtering A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.
  • cold sputtering The application of coating without heating of the substrates.
  • cathode sputtering The method of disintegrating the substance of the cathode by bombarding it with ions and depositing it on another electrode or electron tube envelope.
  • magnetron sputtering A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the target in order to intensify the bombardment of ions...
  • planar magnetron A device used in the sputtering of thin films, in which a magnet system on the back of the cathode deflects the electrons, lengthening the ionization path. The accelerated ions transfer their momentum to particles of the coating material, which are...
  • vacuum apparatus Equipment dependent on the effects of a vacuum. The principal applications in optics are in the coating of lenses and substrates and the fabrication of multilayer interference filters.
  • sputtering equipment Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface by bombarding a target material with high-energy...
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